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- W2127146518 abstract "Abstract : Point-by-point matrix effect calibration is applied to a variety of AlxGa1-xAs multilayer-multimatrix samples grown by molecular beam epitaxy. The procedure uses the linear dependence of secondary ion yields and sputtering yields on matrix composition to quantify depth profiles through matrix gradients and interfaces. The proposed method provides accurate results in the analysis of samples too complex for conventional quantitative analysis by secondary ion mass spectrometry. (Author)" @default.
- W2127146518 created "2016-06-24" @default.
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- W2127146518 date "1983-10-13" @default.
- W2127146518 modified "2023-09-27" @default.
- W2127146518 title "Point-by-Point Matrix Effect Calibration for the Quantitative Analysis of Layered Semiconductors by Secondary Ion Mass Spectrometry." @default.
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