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- W21278298 abstract "With a Nickel-Silicon alloy as a target of magnetron-sputtering under Ar /O 2 mixed gases, a new type of Ni/Si oxide source called self-released nickel source is fabricated. This kind of nickel source is different with the pure nickel source at both crystallized phenomenon and remainder of Ni. Low temperature poly-Silicon crystallized by self-released nickel source has lower nickel-residua and a controllable crystallization rate related without the thickness of Ni source. That is useful for widen process window. The relations of surface roughness and electrical characters of poly-Si crystallized by different source have been studied and discussed." @default.
- W21278298 created "2016-06-24" @default.
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- W21278298 date "2010-01-01" @default.
- W21278298 modified "2023-09-24" @default.
- W21278298 title "Crystallized poly-silicon thin film laterally induced by the Ni/Si oxide source" @default.
- W21278298 doi "https://doi.org/10.7498/aps.59.2775" @default.
- W21278298 hasPublicationYear "2010" @default.
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