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• W2128247810 abstract "Analytical electron microscopy techniques are used to investigate elemental distributions across a high- dielectric stack with a metal gate. Electron energy-loss spectroscopy results from a gate stack confirm the presence of an oxide interfacial phase at the TiN/a-Si interface prior to activation of the stack." @default.
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• W2128247810 date "2007-01-01" @default.
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• W2128247810 title "Advanced Nanoanalysis of a Hf-Based High-k Dielectric Stack Prior to Activation" @default.
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• W2128247810 doi "https://doi.org/10.1149/1.2718399" @default.
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