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- W2130394537 abstract "A (1120) textured ZnO film can excite SH-SAW. Therefore, the film on various substrates is an attractive option for fabricating the SH-SAW device on a silicon IC, and the device on a curved surface. In this report, the electromechanical coupling coefficients (K <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>1</sup> ) in the ZnO (0deg, 90deg, psi) film/silica glass substrate structures were theoretically estimated. The theoretical results showed that the IDT electrode/ZnO (0deg, 90deg, 55deg) film/silica glass substrate structure had a relatively large K <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sup> value of 3.4 % at H/lambda=0.21. This structure was then fabricated using RF magnetron sputtering technique. The experimental results clearly demonstrated SH-SAW excitation in the structure." @default.
- W2130394537 created "2016-06-24" @default.
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- W2130394537 date "2007-10-01" @default.
- W2130394537 modified "2023-10-16" @default.
- W2130394537 title "4E-4 Propagation Characteristics of SH-SAW in (1120) ZnO Layer/Silica Glass Substrate Structures" @default.
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- W2130394537 doi "https://doi.org/10.1109/ultsym.2007.81" @default.
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