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• W2130606809 abstract "The MOS interface state build-up process was simulated for a 1D MOS structure within a framework of reaction-transport model. The identified kinetics are summarized as simple power laws. The transport-limited mode of half power of the stress time has emerged universally regardless of the charge state of transported species." @default.
• W2130606809 created "2016-06-24" @default.
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• W2130606809 date "2003-01-20" @default.
• W2130606809 modified "2023-09-28" @default.
• W2130606809 title "Transport-reaction model for interface state build-up at the Si-SiO/sub 2/ interface [in MOSFETs]" @default.
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• W2130606809 doi "https://doi.org/10.1109/sispad.1999.799276" @default.
• W2130606809 hasPublicationYear "2003" @default.
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