FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2130647788> ?p ?o ?g. }

• W2130647788 abstract "The growth of ultrathin (&lt;5 nm) Ru-doped Cu2O films deposited on SiO2 by atomic layer deposition (ALD) and Cu films by subsequent reduction of the Cu2O using HCO2H or CO is reported. Ru-doped Cu2O has been deposited by a mixture of 16: 99 mol. % of [(nBu3P)2Cu(acac)] as Cu precursor and 17: 1 mol. % of [Ru(η5-C7H11)(η5-C5H4SiMe3)] as Ru precursor. The catalytic amount of Ru precursor was to support low temperature reduction of Cu2O to metallic Cu by formic acid (HCO2H) on arbitrary substrate. In situ x-ray photoelectron spectroscopy investigations of the Cu2O ALD film indicated nearly 1 at. % of carbon contamination and a phosphorous contamination below the detection limit after sputter cleaning. Systematic investigations of the reduction of Ru-doped Cu2O to metallic Cu by HCO2H or CO as reducing agents are described. Following the ALD of 3.0 nm Cu2O, the ultrathin films are reduced between 100 and 160 °C. The use of HCO2H at 110 °C enabled the reduction of around 90% Cu2O. HCO2H is found to be very effective in the removal of oxygen from Ru-doped Cu2O films with 2.5–4.7 nm thickness. In contrast, CO was effective for the removal of oxygen from the Cu2O films only below 3.0 nm at 145 °C. Root mean square surface roughness of 0.4 ± 0.1 nm was observed from atomic force microscopy (AFM) investigations after the ALD of Cu2O, followed by the subsequent reduction of 3.0 nm Cu2O using either HCO2H at 110 °C or CO at 145 °C on SiO2. Furthermore, ex situ low energy ion scattering and AFM investigations confirmed that the Cu2O film after ALD and Cu films after subsequent reduction was continuous on the SiO2 substrate." @default.
• W2130647788 created "2016-06-24" @default.
• W2130647788 creator A5023706233 @default.
• W2130647788 creator A5027447517 @default.
• W2130647788 creator A5035562384 @default.
• W2130647788 creator A5035669888 @default.
• W2130647788 creator A5039877065 @default.
• W2130647788 creator A5047693293 @default.
• W2130647788 creator A5058872102 @default.
• W2130647788 creator A5060204434 @default.
• W2130647788 creator A5066778673 @default.
• W2130647788 creator A5067583267 @default.
• W2130647788 date "2015-10-15" @default.
• W2130647788 modified "2023-09-25" @default.
• W2130647788 title "Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by <i>in situ</i> x-ray photoelectron spectroscopy" @default.
• W2130647788 cites W1229216614 @default.
• W2130647788 cites W1655049005 @default.
• W2130647788 cites W1668040035 @default.
• W2130647788 cites W1680479491 @default.
• W2130647788 cites W1878574187 @default.
• W2130647788 cites W1972494812 @default.
• W2130647788 cites W1972893978 @default.
• W2130647788 cites W1980664966 @default.
• W2130647788 cites W1980906999 @default.
• W2130647788 cites W1992214743 @default.
• W2130647788 cites W1995191254 @default.
• W2130647788 cites W2013202846 @default.
• W2130647788 cites W2016004786 @default.
• W2130647788 cites W2016592109 @default.
• W2130647788 cites W2017293320 @default.
• W2130647788 cites W2023031326 @default.
• W2130647788 cites W2023603575 @default.
• W2130647788 cites W2037660969 @default.
• W2130647788 cites W2038245434 @default.
• W2130647788 cites W2053440006 @default.
• W2130647788 cites W2070316099 @default.
• W2130647788 cites W2070344891 @default.
• W2130647788 cites W2075893251 @default.
• W2130647788 cites W2076917117 @default.
• W2130647788 cites W2077461818 @default.
• W2130647788 cites W2083137552 @default.
• W2130647788 cites W2084971153 @default.
• W2130647788 cites W2088188343 @default.
• W2130647788 cites W2090607539 @default.
• W2130647788 cites W2093312403 @default.
• W2130647788 cites W2093842413 @default.
• W2130647788 cites W2111210304 @default.
• W2130647788 cites W2134707622 @default.
• W2130647788 cites W2137108081 @default.
• W2130647788 cites W2140017579 @default.
• W2130647788 cites W2158932701 @default.
• W2130647788 cites W2161508873 @default.
• W2130647788 cites W2162501803 @default.
• W2130647788 cites W2164875540 @default.
• W2130647788 cites W2171908409 @default.
• W2130647788 cites W2320375341 @default.
• W2130647788 doi "https://doi.org/10.1116/1.4933088" @default.
• W2130647788 hasPublicationYear "2015" @default.
• W2130647788 type Work @default.
• W2130647788 sameAs 2130647788 @default.
• W2130647788 citedByCount "6" @default.
• W2130647788 countsByYear W21306477882017 @default.
• W2130647788 countsByYear W21306477882020 @default.
• W2130647788 countsByYear W21306477882021 @default.
• W2130647788 countsByYear W21306477882023 @default.
• W2130647788 crossrefType "journal-article" @default.
• W2130647788 hasAuthorship W2130647788A5023706233 @default.
• W2130647788 hasAuthorship W2130647788A5027447517 @default.
• W2130647788 hasAuthorship W2130647788A5035562384 @default.
• W2130647788 hasAuthorship W2130647788A5035669888 @default.
• W2130647788 hasAuthorship W2130647788A5039877065 @default.
• W2130647788 hasAuthorship W2130647788A5047693293 @default.
• W2130647788 hasAuthorship W2130647788A5058872102 @default.
• W2130647788 hasAuthorship W2130647788A5060204434 @default.
• W2130647788 hasAuthorship W2130647788A5066778673 @default.
• W2130647788 hasAuthorship W2130647788A5067583267 @default.
• W2130647788 hasConcept C111368507 @default.
• W2130647788 hasConcept C113196181 @default.
• W2130647788 hasConcept C127313418 @default.
• W2130647788 hasConcept C127413603 @default.
• W2130647788 hasConcept C13965031 @default.
• W2130647788 hasConcept C171250308 @default.
• W2130647788 hasConcept C175708663 @default.
• W2130647788 hasConcept C178790620 @default.
• W2130647788 hasConcept C185592680 @default.
• W2130647788 hasConcept C19067145 @default.
• W2130647788 hasConcept C191897082 @default.
• W2130647788 hasConcept C192562407 @default.
• W2130647788 hasConcept C22423302 @default.
• W2130647788 hasConcept C2777289219 @default.
• W2130647788 hasConcept C2777379063 @default.
• W2130647788 hasConcept C2779227376 @default.
• W2130647788 hasConcept C42360764 @default.
• W2130647788 hasConcept C43617362 @default.
• W2130647788 hasConcept C49040817 @default.
• W2130647788 hasConcept C540031477 @default.
• W2130647788 hasConcept C544153396 @default.
• W2130647788 hasConcept C57863236 @default.
• W2130647788 hasConcept C69544855 @default.
• W2130647788 hasConceptScore W2130647788C111368507 @default.

• next