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- W2131279929 abstract "Silica grids with micron to sub-micron mesh sizes and wire diameters of 50 nm are fabricated on fused silica substrates. They are formed by single-pulse structured excimer laser irradiation of a UV-absorbing silicon suboxide (SiO x ) coating through the transparent substrate. A polydimethylsiloxane (PDMS) superstrate (cover layer) coated on top of the SiO x film prior to laser exposure serves as confinement for controlled laser-induced structure formation. At sufficiently high laser fluence, this process leads to grids consisting of a periodic loop network connected to the substrate at regular positions. By an additional high-temperature annealing, the residual SiO x is oxidized, and a pure SiO2 grid is obtained. 81.07.-b; 81.07.Gf; 81.65.Cf" @default.
- W2131279929 created "2016-06-24" @default.
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- W2131279929 date "2014-03-02" @default.
- W2131279929 modified "2023-09-27" @default.
- W2131279929 title "Pulsed laser-induced formation of silica nanogrids" @default.
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- W2131279929 doi "https://doi.org/10.1186/1556-276x-9-102" @default.
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