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• W2131587395 abstract "Large-area nanostructured noble-metal films (Ag, Pt, and Au) can be deposited with high yields and various morphologies on silicon formed between the semiconductor and the noble metal by means of a galvanic cell. It is shown that the morphology of Ag, which is different from that of Pt and Au, can be influenced markedly by the deposition conditions. Distinctive surface-enhanced Raman-scattering features are observed on these Ag films." @default.
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• W2131587395 date "2005-01-01" @default.
• W2131587395 modified "2023-10-09" @default.
• W2131587395 title "Galvanic Deposition of Nanostructured Noble-Metal Films on Silicon" @default.
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• W2131587395 doi "https://doi.org/10.1149/1.2033616" @default.
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