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- W2131997423 abstract "We investigated As and P depth profiles implanted at very high dose and low energy. Arsenic depth profiles calculated considering sputtering phenomena show good agreement with experimental data. When implantation dose is larger than 1/spl times/10/sup 16/ cm/sup -2/, sputtering phenomena cannot be ignored. Implantation energy does not affect so much the effective implantation dose under such a high dose condition. In the case of P/sup +/ implantation, experimental results cannot be explained quantitatively by the calculation. This result implies that light atoms such as P should be explained with other dopant loss mechanisms such as backscattering or resputtering." @default.
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- W2131997423 date "2002-11-28" @default.
- W2131997423 modified "2023-09-28" @default.
- W2131997423 title "Influence of high dose low energy ion implantation on dopant depth profile" @default.
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- W2131997423 doi "https://doi.org/10.1109/iit.1998.813769" @default.
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