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- W2133313504 abstract "The atomic layer deposition (ALD) of Gd 2 O 3 from tris(isopropyl‐cyclopentadienyl) gadolinium (Gd( i PrCp) 3 ) and O 3 is studied as a function of the O 2 /N 2 ratio used to generate O 3 . ALD using O 3 with low N 2 content leads to the formation of a hydroxyl‐terminated surface after combustion reactions during O 3 exposure followed by proton transfer and ligand release during the Gd( i PrCp) 3 half cycle. This condition leads to the presence of parasitic chemical vapor deposition (CVD) due to the hygroscopicity of Gd 2 O 3 . By contrast, long O 3 pulses with high N 2 content lead to the dehydroxylation of the surface and to the suppression of both the proton transfer during the Gd( i PrCp) 3 half cycle as well as the parasitic CVD reactions." @default.
- W2133313504 created "2016-06-24" @default.
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- W2133313504 date "2015-11-10" @default.
- W2133313504 modified "2023-10-09" @default.
- W2133313504 title "Ozone-Based Atomic Layer Deposition of Gd<sub>2</sub>O<sub>3</sub>from Tris(isopropyl-cyclopentadienyl)gadolinium: Growth Characteristics and Surface Chemistry" @default.
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- W2133313504 doi "https://doi.org/10.1002/cvde.201507196" @default.
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