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• W2134790257 abstract "This paper presents an automated methodology for calibrating the doping profile and accurately predicting substrate parasitics with boundary element solvers. The technique requires fabrication of only a few test structures and results in an accurate three-layered approximation of a heavily doped epitaxial silicon substrate. Using this approximation, the extracted substrate resistances are accurate to within 10% of measurements. The calibrated parasitic extractor results in good agreement between simulations and measurements for substrate noise coupling in fabricated test circuits." @default.
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• W2134790257 date "2005-07-01" @default.
• W2134790257 modified "2023-09-26" @default.
• W2134790257 title "Accurate prediction of substrate parasitics in heavily doped CMOS processes using a calibrated boundary element solver" @default.
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• W2134790257 doi "https://doi.org/10.1109/tvlsi.2005.850106" @default.
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