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- W2135662506 abstract "A synthetic avenue for the formation of yttrium oxide thin films on Si native oxide surfaces is demonstrated by the reaction of Tris(2,2,6,6-tetramethyl-3,5-heptanedionato) yttrium(III) with inorganic (H2O2) and organic (tert-butyl and di-tert-amyl) peroxides in supercritical carbon dioxide. The reactions are carried out in a hot wall reactor at temperatures below 130 °C and pressures ranging from 13.10 to 22.75 MPa. Spectroscopic Ellipsometry verifies thin film formation and X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy measurements confirm formation of yttrium oxide films and the presence of carbonate and hydroxide species which are removed after high temperature anneals." @default.
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- W2135662506 date "2008-07-01" @default.
- W2135662506 modified "2023-09-27" @default.
- W2135662506 title "Deposition of yttrium oxide thin films in supercritical carbon dioxide" @default.
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- W2135662506 doi "https://doi.org/10.1016/j.tsf.2007.11.104" @default.
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