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• W2136088894 endingPage "357" @default.
• W2136088894 startingPage "352" @default.
• W2136088894 abstract "The reliable and reproducible fabrication of nanostructures by stencil lithography (SL) faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nanoapertures in the stencil membranes. This study reports on these three important issues and presents corresponding solutions for the patterning of nanostructures by SL. To increase the stiffness and the stability of the membranes, we have used a hexagonal array of corrugations to globally reinforce the stencil membranes. To correct the blurring, we have used a corrective etching that improves the definition of Al nanostructures. Using this corrective etching, we have fabricated poly-Si nanowires. Finally, we have used metal wet etching to remove the material accumulated on the membranes as a remedy to the clogging." @default.
• W2136088894 created "2016-06-24" @default.
• W2136088894 creator A5025457422 @default.
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• W2136088894 date "2011-03-01" @default.
• W2136088894 modified "2023-10-16" @default.
• W2136088894 title "Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring, and Clogging Corrections" @default.
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• W2136088894 doi "https://doi.org/10.1109/tnano.2010.2042724" @default.
• W2136088894 hasPublicationYear "2011" @default.
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