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• W2137964694 abstract "In a basic study to identify low-loss optics for applications in F2 lithography, five potential coating materials (AlF3, Na3AlF6, MgF2, LaF8, and GdF3) and three deposition methods (thermal evaporation by a resistance heater and by electron beam and ion-beam sputtering) were investigated in the vacuum ultraviolet (VUV) region. Samples were supplied as single-layer coatings on CaF2 substrates by four Japanese coating suppliers. Refractive indices (n) and extinction coefficients (k) of these coatings at 157 nm were evaluated; the transmittance and the reflectance were measured by a VUV spectrometer and were compared. As a result, resistance heating thermal evaporation is seen to be the optimal method for achieving low-loss antireflection coatings. The relation among optical constants, microstructures, and stoichiometry is discussed." @default.
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• W2137964694 date "2002-06-01" @default.
• W2137964694 modified "2023-10-07" @default.
• W2137964694 title "Development of optical coatings for 157-nm lithography I Coating materials" @default.
• W2137964694 cites W2043295252 @default.
• W2137964694 doi "https://doi.org/10.1364/ao.41.003242" @default.
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