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- W2140236343 abstract "Abstract : ;Contents: Resistivity; dopant profiles; Crystal defects and contaminants; Oxide film characterization; Test patterns; Photolithography; Epitaxial layer thickness; Wafer inspection and test; Interconnection bonding; Hermeticity; Thermal properties of devices." @default.
- W2140236343 created "2016-06-24" @default.
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- W2140236343 date "1975-01-01" @default.
- W2140236343 modified "2023-09-23" @default.
- W2140236343 title "Semiconductor measurement technology" @default.
- W2140236343 doi "https://doi.org/10.6028/nbs.sp.400-12" @default.
- W2140236343 hasPublicationYear "1975" @default.
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