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- W2140254962 abstract "The paper contains a study of the structure and properties of 110 nm thick silicon dioxide films obtained by thermal oxidation of silicon in various atmospheres. The formation of one or another crystal phases in the oxides is explained on the basis of a double-zone model of the heterogeneous silicon oxidation reaction.[Russian Text Ignored]." @default.
- W2140254962 created "2016-06-24" @default.
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- W2140254962 date "1984-12-16" @default.
- W2140254962 modified "2023-09-25" @default.
- W2140254962 title "Structure and properties of silicon dioxide thermal films. II. 110 nm thick SiO2 films" @default.
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- W2140254962 doi "https://doi.org/10.1002/pssa.2210860203" @default.
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