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- W2140537836 abstract "Perovskite-type nitrogen substituted SrTiO3 thin films were deposited with a one-step process by RF-plasma assisted pulsed laser deposition from a SrTiO3 target using a N2 plasma, while deposition with a NH3 plasma yields films with almost no incorporated nitrogen. The deposited films exhibit a cubic perovskite-type crystal structure and reveal oriented growth on MgO(100) substrates. The unit cell parameters of the studied N-doped SrTiO3 films range within 3.905<a<3.918 Å, which is slightly larger than for SrTiO3 (a=3.905 Å). The nitrogen content in the deposited films varies from 0.2 to 0.7 atom%. The amount of incorporated nitrogen in the films decreases with increasing RF-power, while the N2 flow rate does not have any pronounced influence on the N content. Nitrogen incorporation results in an increased optical absorption at 400–600 nm, which is associated with N(2p) energy states that have a higher energy level than the valence band in strontium titanate. The optical band gap energies in the studied N-doped SrTiO3 films are at 3.2–3.3 eV, which is very similar to that of pure strontium titanate (∼3.2 eV). Films deposited with NH3 for the RF-plasma exhibit a lower degree of crystallinity and reveal almost no nitrogen incorporation into the crystal lattice." @default.
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- W2140537836 date "2008-06-13" @default.
- W2140537836 modified "2023-10-18" @default.
- W2140537836 title "RF-plasma assisted pulsed laser deposition of nitrogen-doped SrTiO3 thin films" @default.
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- W2140537836 doi "https://doi.org/10.1007/s00339-008-4702-0" @default.
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