Matches in SemOpenAlex for { <https://semopenalex.org/work/W2141924086> ?p ?o ?g. }
Showing items 1 to 97 of
97
with 100 items per page.
- W2141924086 endingPage "06F304" @default.
- W2141924086 startingPage "06F304" @default.
- W2141924086 abstract "As a low cost and high throughput method for nanoscale pattern replication, step and flash imprint lithography (SFIL) with UV transparent masters is gaining prominence for its potential in photonics and integrated-circuit fabrication. However, dielectric materials appropriate for fabricating nanostructured SFIL masters present a challenge when employing electron beam lithography (EBL) because insulator substrates covered by polymeric resists such as PMMA tend to accumulate charge during EBL exposures, thereby degrading the process. In this work we explore the performance of four different EBL anticharging schemes for nanofabrication of dense arrays of dots having diameters 16–30 nm in PMMA on UV transparent fused silica (FS) substrates. These include overlayers of aluminum or a water-soluble conducting polymer, as well as sandwiching of Al or Cr thin films between the substrate and PMMA. The quality of patterns transferred from PMMA into the underlying metallic layers was analyzed, and the grain size of the metal was found to be the limiting factor determining the edge roughness. The best resolution was attained employing the conducting polymer top-coating. This scheme also involves fewer processing steps. The authors have used this technique for lift-off of Cr and Au as well as Cr masked etch transfer of nanosized patterns into glass substrates for UV-transparent master mold fabrication." @default.
- W2141924086 created "2016-06-24" @default.
- W2141924086 creator A5027185439 @default.
- W2141924086 creator A5030349620 @default.
- W2141924086 creator A5045101484 @default.
- W2141924086 creator A5080629925 @default.
- W2141924086 date "2011-11-01" @default.
- W2141924086 modified "2023-10-03" @default.
- W2141924086 title "Nanopatterning of PMMA on insulating surfaces with various anticharging schemes using 30 keV electron beam lithography" @default.
- W2141924086 cites W1969580750 @default.
- W2141924086 cites W1973440585 @default.
- W2141924086 cites W1993402801 @default.
- W2141924086 cites W2000267719 @default.
- W2141924086 cites W2018430999 @default.
- W2141924086 cites W2020754430 @default.
- W2141924086 cites W2023641056 @default.
- W2141924086 cites W2047533365 @default.
- W2141924086 cites W2050141659 @default.
- W2141924086 cites W2088571642 @default.
- W2141924086 cites W2139516044 @default.
- W2141924086 cites W4247571964 @default.
- W2141924086 cites W1995305329 @default.
- W2141924086 doi "https://doi.org/10.1116/1.3636367" @default.
- W2141924086 hasPublicationYear "2011" @default.
- W2141924086 type Work @default.
- W2141924086 sameAs 2141924086 @default.
- W2141924086 citedByCount "19" @default.
- W2141924086 countsByYear W21419240862013 @default.
- W2141924086 countsByYear W21419240862014 @default.
- W2141924086 countsByYear W21419240862015 @default.
- W2141924086 countsByYear W21419240862016 @default.
- W2141924086 countsByYear W21419240862018 @default.
- W2141924086 countsByYear W21419240862019 @default.
- W2141924086 countsByYear W21419240862021 @default.
- W2141924086 countsByYear W21419240862023 @default.
- W2141924086 crossrefType "journal-article" @default.
- W2141924086 hasAuthorship W2141924086A5027185439 @default.
- W2141924086 hasAuthorship W2141924086A5030349620 @default.
- W2141924086 hasAuthorship W2141924086A5045101484 @default.
- W2141924086 hasAuthorship W2141924086A5080629925 @default.
- W2141924086 hasConcept C105487726 @default.
- W2141924086 hasConcept C107365816 @default.
- W2141924086 hasConcept C136525101 @default.
- W2141924086 hasConcept C142724271 @default.
- W2141924086 hasConcept C159985019 @default.
- W2141924086 hasConcept C162117346 @default.
- W2141924086 hasConcept C163581340 @default.
- W2141924086 hasConcept C171250308 @default.
- W2141924086 hasConcept C192562407 @default.
- W2141924086 hasConcept C200274948 @default.
- W2141924086 hasConcept C204223013 @default.
- W2141924086 hasConcept C204787440 @default.
- W2141924086 hasConcept C2779227376 @default.
- W2141924086 hasConcept C49040817 @default.
- W2141924086 hasConcept C521977710 @default.
- W2141924086 hasConcept C53524968 @default.
- W2141924086 hasConcept C70520399 @default.
- W2141924086 hasConcept C71924100 @default.
- W2141924086 hasConceptScore W2141924086C105487726 @default.
- W2141924086 hasConceptScore W2141924086C107365816 @default.
- W2141924086 hasConceptScore W2141924086C136525101 @default.
- W2141924086 hasConceptScore W2141924086C142724271 @default.
- W2141924086 hasConceptScore W2141924086C159985019 @default.
- W2141924086 hasConceptScore W2141924086C162117346 @default.
- W2141924086 hasConceptScore W2141924086C163581340 @default.
- W2141924086 hasConceptScore W2141924086C171250308 @default.
- W2141924086 hasConceptScore W2141924086C192562407 @default.
- W2141924086 hasConceptScore W2141924086C200274948 @default.
- W2141924086 hasConceptScore W2141924086C204223013 @default.
- W2141924086 hasConceptScore W2141924086C204787440 @default.
- W2141924086 hasConceptScore W2141924086C2779227376 @default.
- W2141924086 hasConceptScore W2141924086C49040817 @default.
- W2141924086 hasConceptScore W2141924086C521977710 @default.
- W2141924086 hasConceptScore W2141924086C53524968 @default.
- W2141924086 hasConceptScore W2141924086C70520399 @default.
- W2141924086 hasConceptScore W2141924086C71924100 @default.
- W2141924086 hasIssue "6" @default.
- W2141924086 hasLocation W21419240861 @default.
- W2141924086 hasOpenAccess W2141924086 @default.
- W2141924086 hasPrimaryLocation W21419240861 @default.
- W2141924086 hasRelatedWork W1968289716 @default.
- W2141924086 hasRelatedWork W1993698036 @default.
- W2141924086 hasRelatedWork W2007023140 @default.
- W2141924086 hasRelatedWork W2039969115 @default.
- W2141924086 hasRelatedWork W2055565127 @default.
- W2141924086 hasRelatedWork W2065914125 @default.
- W2141924086 hasRelatedWork W2075721396 @default.
- W2141924086 hasRelatedWork W2145411830 @default.
- W2141924086 hasRelatedWork W2890402440 @default.
- W2141924086 hasRelatedWork W573585812 @default.
- W2141924086 hasVolume "29" @default.
- W2141924086 isParatext "false" @default.
- W2141924086 isRetracted "false" @default.
- W2141924086 magId "2141924086" @default.
- W2141924086 workType "article" @default.