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• W2142591330 abstract "Calculates gate currents of nanoscale MOSFETs with ultrathin gate oxides for different gate and drain biases by directly solving the Schrodinger, electron-Boltzmann, Poisson and hole-continuity equations. Computations give rise to a subband structure that is populated using the calculated distribution function. The resulting tunneling current versus gate voltage curves show oscillatory structure which reflects quantum effects." @default.
• W2142591330 created "2016-06-24" @default.
• W2142591330 creator A5003413187 @default.
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• W2142591330 date "2002-11-13" @default.
• W2142591330 modified "2023-09-26" @default.
• W2142591330 title "Modeling the limits of gate oxide scaling with a Schrodinger-based method of direct tunneling gate currents of nanoscale MOSFETs" @default.
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• W2142591330 doi "https://doi.org/10.1109/nano.2001.966444" @default.
• W2142591330 hasPublicationYear "2002" @default.
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