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- W2143140573 abstract "A metal/insulator microtube with micromesh walls was constructed using stress-assisted self-rolling technology. The mesh-sidewall Pt/Ti/SiO2 microtube was self-formed by a tensile-stressed metal Pt/Ti film deposited onto a pre-patterned SiO2 micromesh layer. The microtube measured about 25 µm in diameter and was longer than 7 mm. The sidewall of the microtube was a square mesh, 5–20 µm long, and was electrically connected to electrical pads for electrical conductance measurement. The electrical resistance of the rolled-up microtube was measured to be 250–350 Ω when the microtube resistor's length was around 540 µm. The real-time measurement of the conductance change of the microtube with a Pt resistor could monitor the temperature change generated by heat injection. The microtube with micromesh walls is expected to be an interesting structure that has promising potential for use in electronics, chemical and biological applications." @default.
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- W2143140573 date "2012-11-30" @default.
- W2143140573 modified "2023-10-01" @default.
- W2143140573 title "Stress-induced self-rolled metal/insulator bifilm microtube with micromesh walls" @default.
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- W2143140573 doi "https://doi.org/10.1088/0960-1317/23/1/015003" @default.
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