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• W2143282105 abstract "Improving the conductivity of earth-abundant transparent conductive oxides (TCOs) remains an important challenge that will facilitate the replacement of indium-based TCOs. Here, we show that a hydrogen (H2)-plasma post-deposition treatment improves the conductivity of amorphous aluminum-doped zinc tin oxide while retaining its low optical absorption. We found that the H2-plasma treatment performed at a substrate temperature of 50 °C reduces the resistivity of the films by 57% and increases the absorptance by only 2%. Additionally, the low substrate temperature delays the known formation of tin particles with the plasma and it allows the application of the process to temperature-sensitive substrates." @default.
• W2143282105 created "2016-06-24" @default.
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• W2143282105 date "2014-09-01" @default.
• W2143282105 modified "2023-10-18" @default.
• W2143282105 title "Hydrogen plasma treatment for improved conductivity in amorphous aluminum doped zinc tin oxide thin films" @default.
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• W2143282105 doi "https://doi.org/10.1063/1.4896051" @default.
• W2143282105 hasPublicationYear "2014" @default.
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