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- W2144194213 abstract "Abstract For the use of Nb-based alloys at high temperatures, a high oxidation resistant coating such as NbSi 2 coating is required. In the present study, to clarify the physico-chemical compatibility between Nb and NbSi 2 , the extent of the interfacial reaction and the reaction products were studied at temperatures ranging from 1573 to 1773 K. Growth of the reaction layer formed in the interfacial reactions was caused by the preferential diffusion of Si toward to the Nb side, leading to the formation of a Nb 5 Si 3 layer. The growth followed a parabolic rate law, and the growth rate constant was expressed by k p (m 2 s −1 ) = 7.98 × 10 −10 exp(−131.84 kJ mol −1 / RT ). In addition, behavior of boron in the Nb/NbSi 2 interfacial reaction was clarified." @default.
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- W2144194213 date "2008-09-01" @default.
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- W2144194213 title "Interfacial reactions in Nb/NbSi2 and Nb/NbSi2–B systems" @default.
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- W2144194213 doi "https://doi.org/10.1016/j.vacuum.2008.04.080" @default.
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