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- W2144351667 abstract "The Schottky barrier height and ideality factor of Ti on p-type strained-Si (grown on a graded relaxed Si0.82Ge0.18 buffer layer) were investigated in the temperature range 200–300 K using the current-voltage (I-V) characteristics and were found to be temperature dependent. While the ideality factor decreases with an increase in temperature, the barrier height increases." @default.
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- W2144351667 date "1997-12-01" @default.
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- W2144351667 title "Schottky diode characteristics of Ti on strained-Si" @default.
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- W2144351667 doi "https://doi.org/10.1016/s0038-1101(97)00143-3" @default.
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