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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2147612859> ?p ?o ?g. }

• W2147612859 abstract "The paper proposes solutions for the future scaling of tunnel and interpoly dielectrics (IPD) in flash memories based on high-k materials. The concept of engineered barriers is reviewed as well as the main reliability issues associated with the introduction of these materials in nonvolatile memory (NVM) devices. For completeness, the application of high-k materials in charge trapping devices is also addressed." @default.
• W2147612859 created "2016-06-24" @default.
• W2147612859 creator A5043193313 @default.
• W2147612859 date "2005-08-16" @default.
• W2147612859 modified "2023-10-03" @default.
• W2147612859 title "High-k materials for nonvolatile memory applications" @default.
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• W2147612859 doi "https://doi.org/10.1109/relphy.2005.1493090" @default.
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