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- W2148444624 abstract "Directed self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high χ parameter. However, it is often difficult to achieve perpendicular patterns by thermal annealing of BCPs with a lower surface energy block, which tends to align with the air interface. New top surface treatment materials that provide a surface energy between those of the blocks have been developed that enable perpendicular pattern alignment with block copolymers that have a low surface energy block." @default.
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- W2148444624 date "2012-01-01" @default.
- W2148444624 modified "2023-09-27" @default.
- W2148444624 title "Block Copolymer Orientation Control Using a Top-Coat Surface Treatment" @default.
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- W2148444624 doi "https://doi.org/10.2494/photopolymer.25.125" @default.
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