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- W2148577074 abstract "Abstract Fused KHSO 4 can be used as both a polish and a preferential etchant for the {001} surfaces of rutile, depending on the temperature of the system. Polishing occurs at temperatures above 550°C. At temperatures below 550°C, three types of etch pit are observed, two well defined with regular shapes (sides parallel to the and and directions, respectively) and one irregularly shaped. Photochemical deposition of silver [1] onto the crystal surface and subsequent removal (HNO 3 ) prior to etching causes the irregularly shaped pits to be etched more rapidly than in the case of a surface region that was not predeposited. A chemical reaction mechanism is presented to interpret the observed etching behavior. The crystal structure (i.e. the different ionic composition of different crystallographic planes) and surface chemistry of rutile are considered in the formulation of this mechanism. It is suggested that etchant molecules form surface complexes on the TiO 2 (after dehydration of surface OH groups) through coordination of Ti 4+ via terminal and bridged out-of-plane O 2− positions. Evidence is presented to show that the etching rate-determining reaction is the dissolution of these soluble surface complexes. The observed photochemical effects are explained on the basis of the trapping of photogenerated holes or electrons at certain crystal defects." @default.
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- W2148577074 date "1974-09-01" @default.
- W2148577074 modified "2023-09-23" @default.
- W2148577074 title "Coordination chemistry and kinetics of preferential etching on surfaces of TiO2 (rutile)" @default.
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- W2148577074 doi "https://doi.org/10.1016/s0022-3697(74)80143-5" @default.
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