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- W2149383999 abstract "It is widely known that the presence of oxygen ambient during the deposition affects the properties of MgO films. However, there have not been sufficient studies done that take these effects into consideration. Therefore, in this study, we investigated the effects of O2 ambient during the electron beam evaporation on the properties of both the MgO thin film as a whole and its surface. In terms of its effects on the films as a whole, the growth behavior and crystallographic orientations were considered. In terms of its effects on the surfaces of the films, the surface morphologies and surface electronic structures strongly related to the firing voltages of the panels were investigated. The column sizes of the film formed under O2 ambient were larger than those of the film formed without O2 ambient. The MgO film formed under O2 ambient at a pressure of 2 10 4 Torr had the highest 111 preferred" @default.
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- W2149383999 date "2007-01-01" @default.
- W2149383999 modified "2023-09-25" @default.
- W2149383999 title "Effects of O[sub 2] Ambient on the Properties of MgO Thin Films Deposited by E-Beam Evaporation" @default.
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- W2149383999 doi "https://doi.org/10.1149/1.2776224" @default.
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