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- W2149573618 abstract "Abstract The results of a study of the oxidative mineralisation of 4-CP by oxygen, sensitised by thin films of Degussa P25 TiO 2 , are reported. The films are used under conditions in which the kinetics of photomineralisation are independent of mass transfer effects and stable towards repeated irradiation. Using a TiO 2 film, the process goes through the same mechanism as a TiO 2 dispersion, generating the same intermediates, namely: 4-chlorocatechol and hydroquinone. The kinetics of photomineralisation show clear differences between a TiO 2 film and a dispersion. With TiO 2 films the initial rate of photomineralisation is strongly dependent upon photocatalyst loading, (units; g dm −3 ) reaching a distinct maximum, which appears to be associated with the formation of a monolayer of aggregated particles – the diameter of the aggregated particles is estimated as 0.44 μm. A simple 2D model is presented to help illustrate the features of such a system. With TiO 2 dispersions the rate usually reaches a plateau at ca. 0.5 g dm −3 of TiO 2 . For TiO 2 films the initial rate depends directly upon the incident light intensity, implying that the photocatalytically active particles are under low illumination conditions, partially shielded by the other particles making up each aggregated particle. In contrast, with TiO 2 dispersions R i depends upon I 0.64 , implying that the different light intensities used spanned both the high ( R i ∝I 1/2 ) and low ( R i ∝I ) intensity kinetic regions. The kinetics of photomineralisation of 4-CP, sensitised by TiO 2 films obey the same Langmuir–Hinshelwood expressions as found in most semiconductor photocatalyst work conducted with TiO 2 dispersions. However, in a study of the variation R i as a function of [4-CP] and [O 2 ] the values for the maximum rates were larger, and those for the apparent Langmuir adsorption coefficients were smaller, than those found for TiO 2 dispersions." @default.
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- W2149573618 date "1998-10-01" @default.
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- W2149573618 title "Photomineralisation of 4-chlorophenol sensitised by TiO2 thin films" @default.
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- W2149573618 doi "https://doi.org/10.1016/s1010-6030(98)00361-x" @default.
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