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- W2149807795 abstract "We have performed an experimental study of the effects of ionizing radiation and bias-temperature stress on Si MOS devices with HfSiON gate dielectrics. We compare the responses of homogeneous high-SiN films and low-SiN films that contain crystalline HfO. We observe that the low-SiN films are more sensitive to ionizing radiation than the high-SiN films. In particular, the low-SiN film that includes crystalline HfO is especially vulnerable to electron trapping due to substrate injection under positive irradiation bias. Both film types exhibit reduced radiation-induced charge trapping relative to previous Hf silicates. The high-SiN film exhibits less radiation-induced net oxide-trap charge density than earlier Hf silicate films processed without nitride. We also find that these devices are relatively robust against bias-temperature stress instabilities. Consistent with the radiation response, the low-SiN devices also display elevated levels of charge trapping relative to the high-SiN devices during bias-temperature stress." @default.
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- W2149807795 date "2007-12-01" @default.
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- W2149807795 title "Total Dose and Bias Temperature Stress Effects for HfSiON on Si MOS Capacitors" @default.
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- W2149807795 doi "https://doi.org/10.1109/tns.2007.910862" @default.
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