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• W2149820710 abstract "This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electret-based Vibration Energy Harvesters (e-VEH). This process consists in forming continuous layers of SiO2/Si3N4 electrets in order to limit surface conduction phenomena and is a new way to see the problem of electret patterning. Experimental results prove that patterned electrets charged by a positive corona discharge show excellent stability with high surface charge densities that may reach 5mC/m^2 on 1.1mu m-thick layers, even with fine patterning and harsh temperature conditions (up to 250{deg}C). This paves the way to new e-VEH designs and manufacturing processes." @default.
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• W2149820710 date "2012-01-01" @default.
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• W2149820710 title "New DRIE-Patterned Electrets for Vibration Energy Harvesting" @default.
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• W2149820710 doi "https://doi.org/10.1051/epjconf/20123302010" @default.
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