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• W2149906092 abstract "A simple methodology to fabricate micrometer- and nanometer-scale patterned surfaces with multiple chemical functionalities is presented. Patterns with lateral dimensions down to 110 nm were made. The fabrication process involves multistep gas-phase patterning of amine, thiol, alkyl, and fluorinated alkyl-functional organosilane molecules using PDMS molds as shadow masks. Also, a combination process of channel diffused plasma etching of organosilane molecular thin films in combination with masked gas-phase deposition to fabricate multilength scale, multifunctional surfaces is demonstrated." @default.
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• W2149906092 date "2012-01-20" @default.
• W2149906092 modified "2023-09-28" @default.
• W2149906092 title "Nanoscale Patterning of Organosilane Molecular Thin Films from the Gas Phase and Its Applications: Fabrication of Multifunctional Surfaces and Large Area Molecular Templates for Site-Selective Material Deposition" @default.
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• W2149906092 doi "https://doi.org/10.1021/la204437r" @default.
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