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• W2150351758 abstract "The Cumulative Damage Law for the electrical stress, which correlates charge-to-breakdown with constant current injection (Q/sub bd/) to time-to-breakdown with constant-voltage stress (t/sub bd/), is theoretically derived from the defect generation model. Based on this law, we propose a new gate oxide lifetime prediction method. Although in some cases, the degradation of gate oxide induced by the plasma and ion implantation processes can not be distinguished by t/sub bd/ measurement, the new method allows an accurate and relevant evaluation of process-induced gate oxide degradation." @default.
• W2150351758 created "2016-06-24" @default.
• W2150351758 creator A5026099164 @default.
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• W2150351758 creator A5085914124 @default.
• W2150351758 date "2002-11-19" @default.
• W2150351758 modified "2023-09-25" @default.
• W2150351758 title "A new gate oxide lifetime prediction method using cumulative damage law and its applications to plasma-damaged oxides" @default.
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• W2150351758 doi "https://doi.org/10.1109/iedm.1995.499206" @default.
• W2150351758 hasPublicationYear "2002" @default.
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