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• W2151149098 abstract "Germanosilicides, especially those formed on compressive substrates, are less stable than silicides against agglomeration. By studying the solid-state reaction of Ni thin film on strained , we show that nickel germanosilicide is different from nickel silicide and nickel germanide in several respects: the grains are smaller and faceted, the groove angle is sharper, and dealloying takes place. The germanium out-diffusion creates a stress in the film which favors grooving and agglomeration." @default.
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• W2151149098 date "2007-01-01" @default.
• W2151149098 modified "2023-09-26" @default.
• W2151149098 title "Interplay Between Grain Boundary Grooving, Stress, and Dealloying in the Agglomeration of NiSi[sub 1−x]Ge[sub x] Films" @default.
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• W2151149098 doi "https://doi.org/10.1149/1.2400726" @default.
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