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• W2151157070 abstract "This system permits measurements of the initial breakdown characteristics, determination of the stress condition, and failure analysis consistently based on the evaluation theory. The failure modes both in initial characteristics and the time-dependent dielectric breakdown (TDDB) characteristics are experimentally found to correspond to each other. The intrinsic breakdown is considered to be caused by the concentration of the current in the edge region. The LOCOS structure plays an important role in the lifetime of the gate oxide.< <ETX xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>></ETX>" @default.
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• W2151157070 date "2002-12-04" @default.
• W2151157070 modified "2023-10-13" @default.
• W2151157070 title "Evaluation of gate oxide reliability using luminescence method" @default.
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• W2151157070 doi "https://doi.org/10.1109/icmts.1990.161715" @default.
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