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• W2153359870 abstract "In this paper, we discuss the peculiarities of the design and technology of the Silicon Gated Field Edge Cathode on the hole silicon. Such cathodes have been formed with the help of the CMOS technology of plasma etching with the thermal oxidation." @default.
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• W2153359870 date "2004-03-02" @default.
• W2153359870 modified "2023-09-26" @default.
• W2153359870 title "A silicon gated field edge cathode" @default.
• W2153359870 doi "https://doi.org/10.1109/ivmc.2003.1223041" @default.
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