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- W2156846810 abstract "Processing of MoSi2 via a lower-temperature reactive vapor infiltration route is explored. In this process a loosely compacted molybdenum powder is exposed to a gaseous silicon precursor. Initially, a surface MoSi2 layer forms and, as the process proceeds, a distinct reaction front moves progressively inward. At 1200°C, the silicide layer grows at a rate of about 20 μm/h. The MoSi2 layer is of the high-temperature tetragonal phase. No excess silicon or molybdenum is present, unlike in chemically vapor deposited molybdenum silicide. Irrespective to the volumetric increases involved in siliciding molybdenum to MoSi2, none of the samples, silicided between 1100° and 1300°C, show swelling or surface cracks." @default.
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- W2156846810 date "1993-06-01" @default.
- W2156846810 modified "2023-09-23" @default.
- W2156846810 title "Processing of Molybdenum Disilicide Using a New Reactive Vapor Infiltration Technique" @default.
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- W2156846810 doi "https://doi.org/10.1111/j.1151-2916.1993.tb03955.x" @default.
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