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• W2157444912 abstract "Several CxNy:H specimens (A1–A6) were deposited using a magnetron sputtering system driven at 13.56 MHz in nitrogen with an unbiased substrate using a pure graphite target as the carbon source. For deposition in the inductively coupled plasma (ICP) rig concerned, driven at the same frequency, two source mixtures were used, i.e. either methane (CH4) or adamantane (C10H16) in nitrogen. Examination of the XPS C 1s envelope from the magnetron-deposited films shows different band shapes and two main peak positions depending on the bonding within the films. The band shapes and the energy positions of the peaks present are a function of the film composition (expressed as at.%), itself influenced by the deposition regime. The corresponding specimens deposited with the ICP rig from a CH4/N2 plasma exhibit C 1s envelopes showing clearly a significant difference in their shape (correlated with chemical shift) compared to those magnetron sputter-deposited using the pure graphite target. In the magnetron-deposited films one distinct C 1s band is observed, and its position and the contributing component lines therein change as a function of the relative abundance of C,O and N found in the films examined. The films deposited using C10H16/N2 mixtures give features for the C 1s envelope of the CxNy:H material obtained that, when compared to the data of the two sets of films alluded to above, are again different from those of the magnetron-deposited material. However, they do show similarities to the behaviour of the analogous CH4/N2 films. Comparison of specimens from these three deposition regimes indicates clearly a number of significant compositional and structural differences, depending on the route used. The details of the analogous N 1s component of the same specimens were also investigated. Finally, static SIMS of a diamond-like carbon specimen and CxNy:H films was performed, showing similarities for low m/z and differences for higher m/z, particularly with respect to the oxygen bound in the CxNy:H matrix. Copyright © 2000 John Wiley & Sons, Ltd." @default.
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• W2157444912 date "2000-01-01" @default.
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• W2157444912 title "Comparison of CxNy:H films obtained by deposition using magnetron sputtering or an inductively coupled plasma" @default.
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• W2157444912 doi "https://doi.org/10.1002/1096-9918(200006)29:6<369::aid-sia878>3.0.co;2-d" @default.
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