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• W2157598626 abstract "RF performance of surface micromachined solenoid on-chip inductors fabricated on a standard silicon substrate (10 /spl Omega//spl middot/cm) has been investigated and the results are compared with the same inductors on glass. The solenoid inductor on Si with a 15-μm thick insulating layer achieves peak quality (Q-) factor of 16.7 at 2.4 GHz with inductance of 2.67 nH. This peak Q-factor is about two-thirds of that of the same inductor fabricated on glass. The highest performance has been obtained from the narrowest-pitched on-glass inductor, which shows inductance of 2.3 nH, peak Q-factor of 25.1 at 8.4 GHz, and spatial inductance density of 30 nH/mm <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sup> . Both on-Si and on-glass inductors have been modeled by lumped circuits, and the geometrical dependence of the inductance and Q-factor have been investigated as well." @default.
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• W2157598626 date "1999-09-01" @default.
• W2157598626 modified "2023-10-18" @default.
• W2157598626 title "Surface micromachined solenoid on-Si and on-glass inductors for RF applications" @default.
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• W2157598626 doi "https://doi.org/10.1109/55.784461" @default.
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