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- W2157655137 abstract "In general, it is very hard to correctly predict the elongated contact hole resist reflow process ( CH RRP) due to position shift and pattern size irregularity of RRP, because simple RRP simulator uses isotropic resist flow. Therefore RRP simulator was upgraded which can correctly predict the elongated CH RRP by adding the bulk effect and anisotropic reflow. Optical proximity correction for 32 nm node was also applied to the elongated CH RRP to correctly predict the anisotropic elongated CH. The experimental and simulated CH patterns after RRP were compared and found that the simulator can correctly predict the behavior of complex CH array after RRP." @default.
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- W2157655137 date "2008-06-20" @default.
- W2157655137 modified "2023-09-23" @default.
- W2157655137 title "Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes" @default.
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- W2157655137 doi "https://doi.org/10.1143/jjap.47.4940" @default.
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