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- W2157852324 abstract "The mismatch mechanism in a current mirror consisting of laterally diffused p-channel MOS (LDPMOS) technology was investigated using a scanning electron microscope (SEM) with in situ nanoprobing. The electrical measurement found a saturation current mismatch of 52 μA between the LDPMOS transistors. Furthermore, the proposed inspection identified successfully 0.4-μm p-well layer misalignment, which was the root cause of the mismatch. This letter demonstrates that an in situ nanoprobing system is a powerful tool for enhancing p-well dopant contrast in a SEM, analyzing site-specific failures, and studying device physics under a dynamic scope." @default.
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- W2157852324 date "2011-10-01" @default.
- W2157852324 modified "2023-09-26" @default.
- W2157852324 title "Inspection of the Current-Mirror Mismatch by Secondary Electron Potential Contrast With In Situ Nanoprobe Biasing" @default.
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- W2157852324 doi "https://doi.org/10.1109/led.2011.2161567" @default.
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