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- W2158468837 abstract "Stoichiometry dependence of Fermi-level pinning in a fully silicided (FUSI) NiSi gate on high-K dielectric is investigated. A higher composition ratio of Si in NiSi shows a higher degree of Fermi-level pinning. It has also been found that there is a critical ratio (C/sub crit/) above which there is no Fermi-level pinning, and the C /sub crit/ depends on the underlying gate dielectric material also." @default.
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- W2158468837 date "2005-12-01" @default.
- W2158468837 modified "2023-09-23" @default.
- W2158468837 title "Stoichiometry dependence of Fermi-level pinning in fully silicided (FUSI) NiSi gate on high-K dielectric" @default.
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- W2158468837 doi "https://doi.org/10.1109/led.2005.859631" @default.
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