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- W2158609569 abstract "Parasitic transistors, which cause a subthreshold kink at high substrate bias, are a common phenomenon for STI (shallow trench isolation) technology. The normal cause of this phenomenon is gate oxide thinning at the edge of the STI interface. Due to the much lower threshold voltage for these STI edge parasitic transistors as compared to the main transistor, the off-state leakage current (I/sub off/) may become higher than that in the absence of STI gate oxide thinning. In this paper, an NMOS predope enhanced I/sub off/ outlier that is related to the subthreshold kink was observed. The influence of Npoly predope implant dose and energy was studied and discussed." @default.
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- W2158609569 date "2003-12-22" @default.
- W2158609569 modified "2023-09-27" @default.
- W2158609569 title "NMOS predope enhanced off-state leakage current" @default.
- W2158609569 cites W2063962824 @default.
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- W2158609569 doi "https://doi.org/10.1109/relphy.2003.1197763" @default.
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