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- W2158702913 abstract "The electron velocity overshoot phenomenon in the inversion layer is experimentally investigated using a novel thin-film silicon-on-insulator (SOI) test structure with channel lengths down to 0.08 μm. The uniformity of the carrier density and tangential field is realized by employing a lateral asymmetric channel (LAC) profile. The electron drift velocity observed in this work is 9.5×10 <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>6</sup> cm/s for a device with L/sub eff/=0.08 μm at 300 K. The upward trend in electron velocity can be clearly noticed for decreasing channel lengths." @default.
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- W2158702913 date "1999-10-01" @default.
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- W2158702913 title "Exploration of velocity overshoot in a high-performance deep sub-0.1-μm SOI MOSFET with asymmetric channel profile" @default.
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- W2158702913 doi "https://doi.org/10.1109/55.791935" @default.
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