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• W2159348243 abstract "Epitaxial BaTiO3 thin films were deposited on MgO (100) in a rotating disk vertical metalorganic chemical vapor deposition (MOCVD) reactor at 700°C. The metalorganic sources used were titanium tetraisopropoxide and the highly volatile fluorinated barium precursor (Ba(hfa)2∙pentaethyleneglycolethylbutylether(PEB)). To facilitate growth at the lower temperature while suppressing the formation of BaF2 impurity phases, a strong oxidant consisting of a mixture of 80% N2O and 20% O2 was employed. The BaTiO3 films deposited at 700°C are phase pure and show only BaTiO3 {001} x-ray diffraction peaks. The x-ray rocking curve full width at half maximum (FWHM) of the BaTiO3 (002) peak was 0.82°. The fourfold symmetry and coincident position of the {110} peaks for both the film and substrate confirms in-plane epitaxy of cube-on-cube orientation. The Φ-scan FWHM of the BaTiO3 film is 1.05°. The growth temperature in this work is lower than the temperatures used in most comparable thermal MOCVD epitaxial oxide processes for BaTiO3." @default.
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• W2159348243 date "2005-07-01" @default.
• W2159348243 modified "2023-10-16" @default.
• W2159348243 title "Low temperature deposition of epitaxial BaTiO3 films in a rotating disk vertical MOCVD reactor" @default.
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• W2159348243 doi "https://doi.org/10.1116/1.1993621" @default.
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