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• W2160031408 abstract "The effect of ion implantation on alumina (Al2O3) and silicon carbide (SiC) was investigated by Rutherford backscattering (RBS), indentation hardness, fracture toughness, transmission electron microscopy (TEM), and linear scratching with a diamond stylus. The implanted (10l6 to 1017 Cr.cm−2 at 280 to300 keV, 1 to 4 |MX 10l6Ti.cm −2at 150 keV,2 |MX 1016Zr.cm−2 at 150 keV) AI2O3 lattice is significantly damaged but remains crystalline; the lattice hardness increases, and the scratched surface is less sensitive to fracture. The implanted (1013 to 10l6 N.cm−2 at 62 keV, 1014 to 10l6 Cr.cm −2 at 280 keV) Sic lattice becomes amorphous to a depth of 250 nm, becomes less hard, and deforms without fracture when scratched. The variation in Rutherford backscattered spectra and in surface hardness with annealing are reported and interpreted in terms of lattice defects for the Al2O3 specimens." @default.
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• W2160031408 date "1984-02-01" @default.
• W2160031408 modified "2023-10-14" @default.
• W2160031408 title "Lattice Modification in Ion-Implanted Ceramics" @default.
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• W2160031408 doi "https://doi.org/10.1111/j.1151-2916.1984.tb09627.x" @default.
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