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• W2160142496 abstract "This paper reported the study of growth of Al x Ga 1−x N thin film on a-plane sapphire substrate using plasma assisted metal organic chemical vapor deposition (PA-MOCVD). We have successfully growth the Al content AlGaN alloys and investigated the influence of TMA/TMAl+TMGa flow rate ratio to their crystal structure and surface morphology. From S EM image and XRD measurement, the AlGaN films grown with TMA/TMAl+TMGa flow rate ratio of 20% have single crystal orientation, homogeneous and smoother surface morphology. From ED X microanalysis results, all of the AlGaN alloys have high Al content. The Al content of the AlGaN alloys with TMA/TMAl+TMGa flow rate ratio of 20%, 30%, and 40% is about x = 0.5, 0.6, and 0.65, respectively and grown at the growth temperature about of 700°C." @default.
• W2160142496 created "2016-06-24" @default.
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• W2160142496 date "2010-06-01" @default.
• W2160142496 modified "2023-09-26" @default.
• W2160142496 title "Growth of Al<inf>x</inf>Ga<inf>1&#x2212;x</inf>N epitaxial thin film on sapphire substrate by plasma assisted metal organic chemical vapor deposition (PA-MOCVD)" @default.
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• W2160142496 doi "https://doi.org/10.1109/smelec.2010.5549448" @default.
• W2160142496 hasPublicationYear "2010" @default.
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