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• W2160952596 abstract "A compact laser-produced plasma x-ray source radiates 1 nm x rays with an average power of 24 W in 2π steradians. The x-ray conversion efficiency is 9% of the laser power delivered on target. The 300 W laser power is generated by a compact diode-pumped, solid-state Nd:YAG laser system. The point source x-ray radiation is collimated with a polycapillary optic to a parallel x-ray beam. The collimated plasma source (CPS) is used to demonstrate proximity x-ray lithography of 100 nm lines with a 16 μm gap between the mask and wafer. The CPS is optimized for integration with an x-ray stepper to provide a complete collimated plasma lithography exposure tool for the manufacture of high-speed GaAs devices." @default.
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• W2160952596 date "2003-01-01" @default.
• W2160952596 modified "2023-09-26" @default.
• W2160952596 title "High-power collimated laser-plasma source for proximity x-ray nanolithography" @default.
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• W2160952596 doi "https://doi.org/10.1116/1.1539070" @default.
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