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- W2161274734 abstract "2-Phenylheptamethyltrisilane as a model compound of polysilastyrene was irradiated at a high dose (1440 kGy) of γ-rays without any additive. The trisilane was found to be resistant to γ-rays, while it gave small amounts of Me6Si2, Me3SiSiMe2Ph, Me3SiH, Me3SiSiHMePh and (Me3Si)2 SiMeC6H4SiMe3. These products can be interpreted as being due to a chain contraction of the trisilane with the extrusion of methylphenylsilylene, a methyl migration with the extrusion of dimethylsilylene, a scission of an Si–Si bond due to an attack by hydrogen atoms, and a substitution of a hydrogen atom on the phenyl group by a trimethylsilyl radical. The same reactions, except the chain contraction, are observed in the cases of pentamethylphenyldisilane and 1,2-diphenyltetramethyldisilane. On the basis of the data obtained, the chemical behavior of polysilastyrene during the irradiation is discussed." @default.
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- W2161274734 date "1993-01-01" @default.
- W2161274734 modified "2023-09-27" @default.
- W2161274734 title "γ radiolysis of neat 2-phenylheptamethyltrisilane as a model of polysilastyrene" @default.
- W2161274734 doi "https://doi.org/10.1002/pat.1993.220040105" @default.
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