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• W2162214093 endingPage "1856" @default.
• W2162214093 startingPage "1851" @default.
• W2162214093 abstract "Nitrogen-doped tetrahedral amorphous carbon (ta-C : N) films were deposited by filtered cathodic vacuum arc (FCVA) technique using nitrogen as a background gas. The structure of the ta-C : N films was studied with X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy in terms of nitrogen flow rate used during the film deposition. Potential windows of the films measured in deaerated and unstirred solutions, such as 0.5 M HCl, 0.1 M KCl, 0.1 M NaCl, 0.1 M KOH, and 0.1 M NaOH, were about 2.4, 2.32, 3.2, 3.1, and 3.25 V, respectively. This study showed that the potential windows of the ta-C : N films were also affected by nitrogen flow rate. The ta-C : N films used in this study had the desired voltammetric characteristics suitable for electrochemical analysis." @default.
• W2162214093 created "2016-06-24" @default.
• W2162214093 creator A5004994068 @default.
• W2162214093 creator A5036261474 @default.
• W2162214093 creator A5082685535 @default.
• W2162214093 date "2008-09-01" @default.
• W2162214093 modified "2023-09-25" @default.
• W2162214093 title "Cyclic Voltammetric Behavior of Nitrogen-Doped Tetrahedral Amorphous Carbon Films Deposited by Filtered Cathodic Vacuum Arc" @default.
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• W2162214093 doi "https://doi.org/10.1002/elan.200804249" @default.
• W2162214093 hasPublicationYear "2008" @default.
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