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- W2162868586 abstract "New processes for AlSi/TiW metallization are described, involving simple modifications of the conventional process. An important change is the use of rapid thermal annealing of the TiW before AlSi deposition. The p/sup +/ contact resistance and its deviation are reduced by more than 50%, and the n/sup +/ contact remains good. Reliability implications are also addressed. This simple process is anticipated to upgrade AlSi/TiW metallization. >" @default.
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- W2162868586 date "2003-01-07" @default.
- W2162868586 modified "2023-09-27" @default.
- W2162868586 title "High temperature alloy and contact annealing with RTA on AlSi/TiW metallization" @default.
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- W2162868586 doi "https://doi.org/10.1109/vtsa.1989.68584" @default.
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